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1. Ion Implantation of GrapheneToward IC Compatible Technologies

   http://duke.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwhV3JTsMwELUKXECIXVCWKiwHLqGJM0lsqaqEKspyQGIT4hTZbiyQqhTR9sCX8Ct8Fd_A2ElLK7XlPlHsWTwznvEbQk4CGQdCg3TB154LKdqc9EG4tiQXcaU821X5zG5e6N09azZK5HhKBZ_61ayNKQ66oc85skAj9J4m_mk8_CHrBnYMK1ou5kGcwQA-aPRT43pUd8z1LL-LLnJB5-MrpseX1s80V8nt4LWObbI-y5tM8uuGse7rERjHWZtZIytFxOmc5yqyTkpptkGWRnAIN8ll7bV-3ckcAxUs8rdIWa36Wnc62rk0iNZ4IP58fT_aFlvnuuHYU6T3JtupM7ybx5R7izw1Lx4bV24xYcEVEMc9VwvwACSGCaB5JDRXsQHY45JrDOwAoNViKY2Fp7imIDCWinUrbDHNPZZ6gQx2iMMiEJpqXzKpIJSCcRUpg3qmFSqBgDKpIO-TwjS6ia16Uz8ZsqJMTgdiSVQBTG7mY7QnkR4NSd9zNI5JRJUx2Q4pacwiL4CoTA4Hwk7QmEyFRGRpp49rA0CvHgL1ZtCEAEbrOJ9Bg0kgYKIW4L-2c236WwUYiJyA7_7Hlz2ySM3sDdOtwPfJfO-jnx7kMysq1gR-ATQpABg

   by Kepaptsoglou, D. M; Hofsäss, H; Pierce, W; Bangert, U; Boothroyd, C. B; Ramasse, Q; Zan, R; Gass, M. H; Van den Berg, J. A; Amani, J et al.

   Nano Letters, Volume 13, Issue 10, pp. 4902 - 4907

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2. Current Aperture Vertical \beta -Ga2O3 MOSFETs Fabricated by N- and Si-Ion Implantation (...)

   http://duke.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV1bS8MwGA2bT_rgbYLOC3nw0WxpmzYpjMHYVi-oQ6cOQRhJmrC9dGNuD_57c-mGgg--lUJKyJf0O-Q73zkAXEaCRlwTgUigMSLKnDkREI5cSS5JpcSOVTlid-_h0zPLuhVwtemFUUo58plq2EdXy89ncmWvypostvk5roIqTbHv1dpUDAjxissmQ5r_Ct6UJHHavO_3LIeLNULGSGxN2ddGKmGZR7I9MFrPwJGoG55E4q8TfrGr1zKN_53sPtgtoSXs-L1wACqqOAQ7PwQHa0CVckywM1cLWzuAb45XbYZ9CLXkEF3zcBDBh8Ew6798wowLZyOkcii-4COCvMjhcIpak_btrIBWWpj73qWi1Zy0Yc-1Xx2BVzO6e4NKowU0NfBqiQSm1ARIUx5gpUSOEy6x5CFNqKYsN6hM0ASHXCd5zK2cjrC4yoKvOKJCB9ExgCwxHwh1IJiQJBacpTKRVvxMS7MXODkBNbtG47kX0RiXy1P_-_Up2DYRSz3Z6wxsLRcrde79Gi5c3L8Btsusnw

   by Goto, Ken; Kumagai, Yoshinao; Higashiwaki, Masataka; Murakami, Hisashi and Wong, Man Hoi

   Ieee Electron Device Letters, Volume 40, Issue 3, pp. 431 - 434

   Journal Article : Full Text Online

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3. Non‐Chemical Route to PGM‐Free via N+ Ion Implantation in Vertically Aligned Carbon Nanotubes

   http://duke.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwpV1JS8NAFB7Ekx7cwWqVOQgeJDaZ7FAKpRoXaF1wPYVZbbEk0kXw5k_wN_pLnKVJ25OgxwyZIZl5G-997xsADlwSulh4xPIcYVselzpHHA9buiQXxJTaGlX5GF0-o5vbKGnNdPEbfogy4aY0Q9trpeCYDGtT0lDMhOokV3UhV3f7KuomFSFdtcoyQhiasnLgKICX81SwNtqoNj993itNQ80yYHUnHidZBa_Ft2q49bGBm5jEwxwOuyB0_M9vrYGVSWAKm0aS1sECzzbA8gxd4SbodvLs-_Or4BiACk3E4SiH12dtOZ4MOIfvPQw7R7DebVzkGVTcw9g0N2X1WrcBexl80Ehu3O9_wGa_9yLNPGzhAZFvS0ufj8aED7fAfXJ61zq3Jjc1WNSVDs5iHkUho4g7jPuIiUBEJIhF7DMfUaxSQUS4nFEWRZTYzJZhmqK2j0MsAxQHcXcbwCjwsEDCIRGhnk9wFNOAKvY0QaUwYa8CDosjSt8ME0dqOJdRqjYtLTetAqrFCaYTjRymruNLYYh9JBdC-gB-WSVtniTt8mnnL5N2wRJS1wXrjE0VLI4GY75nbp3Y14L6A8_H6qY

   by Stellino, Elena; Bussetti, Gianlorenzo; Rago, Ilaria; Goto, Francesco; Cavoto, Gianluca; Pandolfi, Francesco; Sbroscia, Marco; Majumdar, Isheta; Ficca, Valerio C.A.; Calloni, Alberto; et al.

   Advanced Functional Materials, Volume 35, Issue 4.

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